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Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
Type:
Conference Proceedings
Info:
ECS Transactions, 16 (4) 239-246 (2008)
Date:
2008-10-15
Author Information
| Name | Institution |
|---|---|
| Christophe Detavernier | Ghent University |
| Jolien Dendooven | Ghent University |
| Davy Deduytsche | Ghent University |
| Jan Musschoot | Ghent University |
Films
Thermal Al2O3
Plasma Al2O3
Plasma Al2O3
Thermal TiN
Plasma TiN
Thermal AlN
Plasma AlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Conformality, Step Coverage
Analysis: Custom
Substrates
| SiO2 |
Notes
| 1180 |