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Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer
Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
Annealing effects on properties of Ga2O3 films deposited by plasma-enhanced atomic layer deposition
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Publication Information
Title:
Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
Type:
Journal
Info:
J. Low Power Electron. Appl. 2015, 5(2), 69
Date:
2015-04-21
Author Information
| Name | Institution |
|---|---|
| K.R.A. Sasaki | University of Sao Paulo |
| Marc Aoulaiche | IMEC |
| Eddy Simoen | IMEC |
| Cor Claeys | IMEC |
| Joao Antonio Martino | University of Sao Paulo |
Films
Film/Plasma Properties
Substrates
| SiO2 |
Keywords
Notes
| 348 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |