Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Understanding and optimizing the floating body retention in FDSOI UTBOX

Type:
Journal
Info:
Nanoscale 2016, Volume 117, Issue , pp 123 - 129
Date:
2015-12-12
DOI:
http://dx.doi.org/10.1016/j.sse.2015.11.021

Author Information

Name Institution
Marc AoulaicheMicron Technology Belgium
Eddy SimoenIMEC
C. CaillatMicron Technology Belgium
L. WittersIMEC
K.K. BourdelleSOITEC
Minh D. NguyenSOITEC-USA
Joao Antonio MartinoUniversity of Sao Paulo
Cor ClaeysIMEC
P. FazanMicron Technology Belgium
M. JurczakIMEC

Films

Plasma TiN

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

SiO2

Notes

552