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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Eddy Simoen Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Eddy Simoen returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
2Dynamic threshold voltage influence on Ge pMOSFET hysteresis
3Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
4Understanding and optimizing the floating body retention in FDSOI UTBOX
5Comparison of the Low-Frequency Noise of Bulk Triple-Gate FinFETs With and Without Dynamic Threshold Operation
6DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures