Publication Information

Title: Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films

Type: Journal

Info: Journal of Vacuum Science & Technology A 31, 01A137 (2013)

Date: 2012-11-14

DOI: http://dx.doi.org/10.1116/1.4769204

Author Information

Name

Institution

Veeco Instruments

Veeco Instruments

Veeco Instruments

Veeco Instruments

Veeco Instruments

Veeco Instruments

Veeco Instruments

Films

Plasma TiN using Veeco NEXUS

Deposition Temperature Range = 150-200C

3275-24-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MRD X-ray Diffractometer

Resistivity, Sheet Resistance

Four-point Probe

4D 280 4 Point Probe

Optical Properties

Ellipsometry

J.A. Woollam EC400

Stress

Stress Measurement

Tencor FLX-2320 A

Etch Rate

Custom

Custom

Images

TEM, Transmission Electron Microscope

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

Unknown

Adhesion

Scotch Tape Test

Unknown

Substrates

SiO2

Keywords

Notes

656



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