Publication Information

Title:
Plasma Enhanced Atomic Layer Deposition on Powders
Type:
Conference Proceedings
Info:
ECS Trans. 2014 volume 64, issue 9, 51-62
Date:
2014-10-06

Author Information

Name Institution
Geert RampelbergGhent University

Films

Thermal Al2O3

Hardware used: Custom Rotary


Thermal TiO2

Hardware used: Custom Rotary


Plasma AlN

Hardware used: Custom Rotary


Plasma TiN

Hardware used: Custom Rotary


Film/Plasma Properties

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Thickness
Analysis: XRF, X-Ray Fluorescence

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope

Substrates

ZnO

Keywords

Powders/Particles

Notes

(PE)ALD of Al2O3, TiO2, AlN, and TiN on powders with custom rotary system.
277