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From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
Carbon content control of silicon oxycarbide film with methane containing plasma
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Publication Information
Title:
Partitioning Electrostatic and Mechanical Domains in Nanoelectromechanical Relays
Type:
Journal
Info:
Journal of Microelectromechanical Systems, (Volume:PP, Issue: 99) Page(s):1
Date:
2014-07-22
Author Information
| Name | Institution |
|---|---|
| M. Shavezipur | Stanford University |
Films
Film/Plasma Properties
Substrates
| Silicon |
Keywords
| NEMS, NanoElectricalMechanical Systems |
Notes
| PEALD TiN for nanoelectromechanical relay. |
| 273 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |