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Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 39, 012410 (2021)
Date:
2020-12-11
Author Information
| Name | Institution |
|---|---|
| Samia Belahcen | Grenoble Alps University (UGA) |
| Christophe Vallée | Grenoble Alps University (UGA) |
| Ahmad Bsiesy | Grenoble Alps University (UGA) |
| Ahmad Chaker | Grenoble Alps University (UGA) |
| Moustapha Jaffal | Grenoble Alps University (UGA) |
| Taguhi Yeghoyan | Grenoble Alps University (UGA) |
| Marceline Bonvalot | Grenoble Alps University (UGA) |
Films
Plasma TiN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| SiO2 |
Notes
| 1661 |