The publication database currently has 1673 entries.
Use Advanced Search for more complex searches
Recent Database Additions
Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 39, 012410 (2021)
Date:
2020-12-11
Author Information
| Name | Institution |
|---|---|
| Samia Belahcen | Grenoble Alps University (UGA) |
| Christophe Vallée | Grenoble Alps University (UGA) |
| Ahmad Bsiesy | Grenoble Alps University (UGA) |
| Ahmad Chaker | Grenoble Alps University (UGA) |
| Moustapha Jaffal | Grenoble Alps University (UGA) |
| Taguhi Yeghoyan | Grenoble Alps University (UGA) |
| Marceline Bonvalot | Grenoble Alps University (UGA) |
Films
Plasma TiN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| SiO2 |
Keywords
| Substrate Biasing |
Notes
| 1661 |