Search 1531 plasma ALD publications by:
Search 1531 plasma ALD publications by:
Publication Information
Title:
Fully CMOS BEOL compatible HfO2 RRAM cell, with low (μA) program current, strong retention and high scalability, using an optimized plasma enhanced atomic layer deposition (PEALD) process for TiN electrode
Type:
Journal
Info:
2011 IEEE International Interconnect Technology Conference
Date:
2011-05-08
Author Information
Name | Institution |
---|---|
Y. Y. Chen | IMEC |
L. Goux | IMEC |
L. Pantisano | IMEC |
J. Swerts | IMEC |
Christoph Adelmann | IMEC |
S. Mertens | IMEC |
V. V. Afanasiev | KU Leuven |
X. P. Wang | IMEC |
B. Govoreanu | IMEC |
R. Degraeve | IMEC |
S. Kubicek | IMEC |
V. Paraschiv | IMEC |
B. Verbrugge | IMEC |
N. Jossart | IMEC |
L. Altimime | IMEC |
M. Jurczak | IMEC |
J. Kittl | IMEC |
Guido Groeseneken | IMEC |
Dirk J. Wouters | IMEC |
Films
Film/Plasma Properties
Substrates
HfO2 |
Keywords
Resistance RAM |
Notes
1365 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |