L. Goux Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by L. Goux returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Fully CMOS BEOL compatible HfO2 RRAM cell, with low (μA) program current, strong retention and high scalability, using an optimized plasma enhanced atomic layer deposition (PEALD) process for TiN electrode
2Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memories