The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
Type:
Journal
Info:
Nanomaterials 2021, 11, 3282
Date:
2021-11-29
Author Information
| Name | Institution |
|---|---|
| Guibai Xie | China Academy of Space Technology (Xi’an) |
| Hongwu Bai | China Academy of Space Technology (Xi’an) |
| Guanghui Miao | China Academy of Space Technology (Xi’an) |
| Guobao Feng | China Academy of Space Technology (Xi’an) |
| Jing Yang | China Academy of Space Technology (Xi’an) |
| Yun He | China Academy of Space Technology (Xi’an) |
| Xiaojun Li | China Academy of Space Technology (Xi’an) |
| Yun Li | China Academy of Space Technology (Xi’an) |
Films
Thermal Al2O3
Plasma TiN
Plasma C
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Thickness
Analysis: -
Characteristic: Raman Shift
Analysis: Raman Spectroscopy
Characteristic: Secondary Electron Yield
Analysis: Custom
Substrates
| SiO2 |
| Al |
| Ag |
Notes
| 1650 |