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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
Type:
Conference Proceedings
Info:
2014 29th Symposium on Microelectronics Technology and Devices (SBMicro)
Date:
2014-09-01
Author Information
| Name | Institution |
|---|---|
| K.R.A. Sasaki | University of Sao Paulo |
Films
Film/Plasma Properties
Substrates
Keywords
| Gate Metal |
Notes
| PEALD TiN gate electrode for MOSFETs. |
| 286 |