Publication Information

Title: Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs

Type: Conference Proceedings

Info: 2014 29th Symposium on Microelectronics Technology and Devices (SBMicro)

Date: 2014-09-01

DOI: http://dx.doi.org/10.1109/SBMicro.2014.6940089

Author Information

Name

Institution

University of Sao Paulo

Films

Plasma TiN using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Gate Metal

Notes

PEALD TiN gate electrode for MOSFETs.

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