Publication Information

Title:
Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
Type:
Conference Proceedings
Info:
2014 29th Symposium on Microelectronics Technology and Devices (SBMicro)
Date:
2014-09-01

Author Information

Name Institution
K.R.A. SasakiUniversity of Sao Paulo

Films

Plasma TiN

Hardware used: Unknown


Film/Plasma Properties

Substrates

Keywords

Gate Metal

Notes

PEALD TiN gate electrode for MOSFETs.
286