Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
Type:
Conference Proceedings
Info:
2015 2nd International Conference on Chemical and Material Engineering (ICCME 2015)
Date:
2015-12-27
Author Information
| Name | Institution |
|---|---|
| Z.X. Chen | A*STAR (Agency for Science, Technology and Research) |
| X. (Picosun Asia) Li | Picosun Asia |
| W.-M. Li | Picosun Asia |
| G.-Q. Lo | A*STAR (Agency for Science, Technology and Research) |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: -
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Chemical Composition, Impurities
Analysis: -
Characteristic: Density
Analysis: -
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Substrates
| Silicon |
Notes
| 480 |