Publication Information

Title:
Plasma-enhanced atomic layer deposition for plasmonic TiN
Type:
Conference Proceedings
Info:
Proc. SPIE 9919, Nanophotonic Materials XIII
Date:
2016-10-03

Author Information

Name Institution
Lauren M. OttoUniversity of Minnesota, Twin Cities
Aaron T. HammackLawrence Berkeley National Laboratory
Shaul AloniLawrence Berkeley National Laboratory
D. Frank OgletreeLawrence Berkeley National Laboratory
Deirdre L. OlynickLawrence Berkeley National Laboratory
Scott DhueyLawrence Berkeley National Laboratory
Bethanie J. H. StadlerUniversity of Minnesota, Twin Cities
Adam M. SchwartzbergLawrence Berkeley National Laboratory

Films

Plasma TiN

Hardware used: Unknown


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Substrates

Keywords

Plasmonics

Notes

946