Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films

Publication Information

Title: Stuffing-enabled surface confinement of silanes used as sealing agents on CF₄ plasma-exposed 2.0 p-OSG films

Type: Journal

Info: Microelectronic Engineering, Available online 10 November 2014

Date: 2014-11-03

DOI: http://dx.doi.org/10.1016/j.mee.2014.11.001

Name

Institution

Yiting Sun

IMEC

3275-24-9

Characteristic

Analysis

Diagnostic

Interconnect

Diffusion Barrier

PEALD TiN for interconnect diffusion barrier application.

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