The publication database currently has 1574 entries.
Search from:
196 Films Compositions
265 Precursors and Plasma Gases
76 Deposition Hardwares
243 Film and Plasma Characteristics
84 Theses
Use Multifactor Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)
ALD Links
Contact Us
Advertising
Recent Database Additions
HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Top Searches for July 2021
Most Searched Precursors
Search 1574 plasma ALD publications by:
Search 1574 plasma ALD publications by:
Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
Type:
Journal
Info:
Microelectronic Engineering, Available online 10 November 2014
Date:
2014-11-03
Author Information
| Name | Institution |
|---|---|
| Yiting Sun | IMEC |
Films
Film/Plasma Properties
Substrates
Keywords
| Interconnect |
| Diffusion Barrier |
Notes
| PEALD TiN for interconnect diffusion barrier application. |
| 289 |