The publication database currently has 1512 entries.
Search from:
189 Films Compositions
401 Precursors and Plasma Gases
73 Deposition Hardwares
238 Film and Plasma Characteristics
79 Theses
Use Multifactor Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)
ALD Links
About plasma-ald.com
Contact Us
Advertising
Recent Database Additions
Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition
From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications
Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2
Search 1512 plasma ALD publications by:
Search 1512 plasma ALD publications by:
Publication Information
Title:
Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
Type:
Journal
Info:
Microelectronic Engineering, Available online 10 November 2014
Date:
2014-11-03
Author Information
| Name | Institution |
|---|---|
| Yiting Sun | IMEC |
Films
Film/Plasma Properties
Substrates
Keywords
| Interconnect |
| Diffusion Barrier |
Notes
| PEALD TiN for interconnect diffusion barrier application. |
| 289 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |