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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
Type:
Journal
Info:
Sensors and Actuators A: Physical, Vol. 240, 160 - 166 (2016)
Date:
2016-01-26
Author Information
| Name | Institution |
|---|---|
| Emmaline Kao | University of California - Berkeley |
| Chen Yang | University of California - Berkeley |
| Roseanne Warren | University of California - Berkeley |
| Alina Kozinda | University of California - Berkeley |
| Liwei Lin | University of California - Berkeley |
Films
Plasma TiN
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Capacitance
Analysis: CV, Cyclic Voltammetry
Substrates
| CNTs, Carbon NanoTubes |
Keywords
| Supercapacitor |
Notes
| 801 |