ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors

Type:
Journal
Info:
Sensors and Actuators A: Physical, Vol. 240, 160 - 166 (2016)
Date:
2016-01-26
DOI:
http://dx.doi.org/10.1016/j.sna.2016.01.044

Author Information

Name Institution
Emmaline KaoUniversity of California - Berkeley
Chen YangUniversity of California - Berkeley
Roseanne WarrenUniversity of California - Berkeley
Alina KozindaUniversity of California - Berkeley
Liwei LinUniversity of California - Berkeley

Films

Plasma TiN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TDMATi, (Me2N)4Ti, [(CH3)2N]4Ti, Tetrakis (DiMethylAmido) Titanium, Titanium Dimethylamide
CAS#: 3275-24-9
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature Range = 200-300C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Capacitance
Analysis: CV, Cyclic Voltammetry
Diagnostic: -

Substrates

CNTs, Carbon NanoTubes

Keywords

Supercapacitor

Notes

801