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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
Search 1573 plasma ALD publications by:
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ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
Type:
Journal
Info:
Sensors and Actuators A: Physical, Vol. 240, 160 - 166 (2016)
Date:
2016-01-26
Author Information
| Name | Institution |
|---|---|
| Emmaline Kao | University of California - Berkeley |
| Chen Yang | University of California - Berkeley |
| Roseanne Warren | University of California - Berkeley |
| Alina Kozinda | University of California - Berkeley |
| Liwei Lin | University of California - Berkeley |
Films
Plasma TiN
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Capacitance
Analysis: CV, Cyclic Voltammetry
Substrates
| CNTs, Carbon NanoTubes |
Keywords
| Supercapacitor |
Notes
| 801 |