Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Roseanne Warren Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Roseanne Warren returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications
2ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
3ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors