ALD ruthenium oxide-carbon nanotube electrodes for supercapacitor applications

Type:
Conference Proceedings
Info:
2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS)
Date:
2014-01-26
DOI:
http://dx.doi.org/10.1109/MEMSYS.2014.6765600

Author Information

Name Institution
Roseanne WarrenUniversity of California - Berkeley
Firas SammouraUniversity of California - Berkeley
Alina KozindaUniversity of California - Berkeley
Liwei LinUniversity of California - Berkeley

Films

Thermal RuO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Bis(EthylCycloPentadienyl)Ruthenium, Ru(EtCp)2
CAS#: 32992-96-4
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Continuity
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Nova

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Technai 12

Characteristic: Chemical Composition, Impurities
Analysis: XRD, X-Ray Diffraction
Diagnostic: Siemens D5000

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: PHI 5400

Characteristic: Unknown
Analysis: CV, Cyclic Voltammetry
Diagnostic: -

Characteristic: ESR, Equivalent Series Resistance
Analysis: EIS, Electrochemical Impedance Spectroscopy
Diagnostic: -

Characteristic: Charge Capacity
Analysis: Repeating Chronoamperometry
Diagnostic: -

Substrates

CNTs, Carbon NanoTubes
Silicon

Notes

Oxygen content of Ru film increases with temperature from 300 to 400C.
Ultratech Fiji PEALD RuO2 for carbon nanotube supercapacitor application.
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