Publication Information

Title: Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: ECS Journal of Solid State Science and Technology, 3 (7) P253-P258 (2014)

Date: 2014-05-14

DOI: http://dx.doi.org/10.1149/2.0141407jss

Author Information

Name

Institution

Aix-Marseille Université

Aix-Marseille Université

Aix-Marseille Université

Aix-Marseille Université

Films

Deposition Temperature = 250C

3275-24-9

7664-41-7

Deposition Temperature = 200C

3275-24-9

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

JEOL JSM-6320F

Morphology, Roughness, Topography

TEM, Transmission Electron Microscope

JEOL 3010

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

INEL

Resistivity, Sheet Resistance

Four-point Probe

HP 4140

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

JEOL JSM-6320F

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Park Systems, XE-100

Thickness

Ellipsometry

J.A. Woollam M-2000V

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

JEOL 3010

Substrates

AAO, Anodic Aluminum Oxide

Si(100)

Keywords

High Aspect Ratio

Notes

Ultratech Fiji thermal and PEALD TiN on high aspect ratio AAO substrates.

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