Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



A high-density carbon fiber neural recording array technology

Type:
Journal
Info:
Journal of Neural Engineering, Volume 16, Number 1
Date:
2018-10-16

Author Information

Name Institution
Travis L. MasseyUniversity of California - Berkeley
Samantha R. SantacruzUniversity of California - Berkeley
Jason F. HouUniversity of California - Berkeley
Kristofer S. J. PisterUniversity of California - Berkeley
Jose M. CarmenaUniversity of California - Berkeley
Michel M. MaharbizUniversity of California - Berkeley

Films

Plasma TiN


Film/Plasma Properties

Substrates

SiO2

Notes

1409