Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Mechanical characterization of hollow ceramic nanolattices

Type:
Journal
Info:
J Mater Sci (2014) 49:2496-2508
Date:
2013-12-02
DOI:
http://dx.doi.org/10.1007/s10853-013-7945-x

Author Information

Name Institution
Lucas R. MezaCalifornia Institute of Technology

Films

Plasma TiN

Hardware used: Oxford Instruments OpAL
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

217