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Plasma-enhanced atomic layer deposition of titanium vanadium nitride
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 06A103 (2018)
Date:
2018-08-17
Author Information
| Name | Institution |
|---|---|
| Mark J. Sowa | Cambridge NanoTech |
| Ling Ju | Lehigh University |
| Alexander Campbell Kozen | U.S. Naval Research Laboratory |
| Nicholas C. Strandwitz | Lehigh University |
| Guosong Zeng | Lehigh University |
| Tomas F. Babuska | Lehigh University |
| Zakaria Hsain | University of Pennsylvania |
| Brandon A. Krick | Lehigh University |
Films
Plasma TiN
Plasma VN
Plasma TiVN
Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
CAS#: 3275-24-9
CAS#: 19824-56-7
CAS#: 7727-37-9
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Wear Rate
Analysis: Pin on Disc
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
| Si with native oxide |
| SiO2 |
Notes
| 1188 |