Publication Information

Title: Plasma-enhanced atomic layer deposition of titanium vanadium nitride

Type: Journal

Info: Journal of Vacuum Science & Technology A 36, 06A103 (2018)

Date: 2018-08-17

DOI: http://dx.doi.org/10.1116/1.5037463

Author Information

Name

Institution

Cambridge NanoTech

Lehigh University

U.S. Naval Research Laboratory

Lehigh University

Lehigh University

Lehigh University

University of Pennsylvania

Lehigh University

Films

Deposition Temperature = 250C

3275-24-9

7727-37-9

Deposition Temperature = 250C

19824-56-7

7727-37-9

Deposition Temperature = 250C

3275-24-9

19824-56-7

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Refractive Index

Ellipsometry

Unknown

Extinction Coefficient

Ellipsometry

Unknown

Resistivity, Sheet Resistance

Four-point Probe

Lucas Labs 302

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Wear Rate

Pin on Disc

Custom

Thickness

XRR, X-Ray Reflectivity

PANalytical Empyrean

Density

XRR, X-Ray Reflectivity

PANalytical Empyrean

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Empyrean

Substrates

Si with native oxide

SiO2

Keywords

Wear Rate

Notes

1188



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