Publication Information

Title:
Plasma-enhanced atomic layer deposition of titanium vanadium nitride
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 06A103 (2018)
Date:
2018-08-17

Author Information

Name Institution
Mark J. SowaCambridge NanoTech
Ling JuLehigh University
Alexander Campbell KozenU.S. Naval Research Laboratory
Nicholas C. StrandwitzLehigh University
Guosong ZengLehigh University
Tomas F. BabuskaLehigh University
Zakaria HsainUniversity of Pennsylvania
Brandon A. KrickLehigh University

Films




Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Wear Rate
Analysis: Pin on Disc

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

Si with native oxide
SiO2

Keywords

Wear Rate

Notes

1188