Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy TDMAV, (Me2N)4V, [(CH3)2N]4V, Tetrakis(DiMethylAmido) Vanadium, Vanadium Dimethylamide CAS# 19824-56-7

TDMAV, (Me2N)4V, [(CH3)2N]4V, Tetrakis(DiMethylAmido) Vanadium, Vanadium Dimethylamide CAS# 19824-56-7 is available from the following source(s):

NumberVendorRegionLink
1Pegasus Chemicals🇬🇧Tetrakis(dimethylamino)vanadium
2Strem Chemicals, Inc.🇺🇸Tetrakis(dimethylamino)vanadium(IV), min. 95% TDMAV
3Ereztech🇺🇸Tetrakis(dimethylamino) vanadium(IV)

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