Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Tomas F. Babuska Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Tomas F. Babuska returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
2Plasma-enhanced atomic layer deposition of vanadium nitride
3Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
4Plasma-enhanced atomic layer deposition of titanium vanadium nitride
5Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure