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Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 39, 012407 (2021)
Date:
2020-12-01
Author Information
| Name | Institution |
|---|---|
| Md. Istiaque Chowdhury | Lehigh University |
| Mark J. Sowa | Veeco Instruments |
| Alexander Campbell Kozen | University of Maryland |
| Brandon A. Krick | Florida State University |
| Jewel Haik | Lehigh University |
| Tomas F. Babuska | Florida State University |
| Nicholas C. Strandwitz | Lehigh University |
Films
Plasma TiN
Plasma MoN
Plasma TiMoN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Resistive Switching
Analysis: Four-point Probe
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Stress
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Si(100) |
| SiO2 |
Notes
| 1597 |