
Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 39, 012407 (2021)
Date:
2020-12-01
Author Information
Name | Institution |
---|---|
Md. Istiaque Chowdhury | Lehigh University |
Mark J. Sowa | Veeco Instruments |
Alexander Campbell Kozen | University of Maryland |
Brandon A. Krick | Florida State University |
Jewel Haik | Lehigh University |
Tomas F. Babuska | Florida State University |
Nicholas C. Strandwitz | Lehigh University |
Films
Plasma TiN
Plasma MoN
Plasma TiMoN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Resistive Switching
Analysis: Four-point Probe
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Stress
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
Si(100) |
SiO2 |
Notes
1597 |