Bis(t-butylimido)bis(dimethylamino)molybdenum, CAS# 923956-62-1

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2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylimido)bis(dimethylamino)molybdenum(VI), 98%
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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 13 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
2Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
3Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
4Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
5Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
6Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
7Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
8Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
9Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
10Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
11Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
12Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
13Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure