Bis(t-butylimido)bis(dimethylamino)molybdenum, CAS# 923956-62-1

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1EreztechBis(t-butylimido) bis(dimethylamino) molybdenum(VI)

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
2Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
3Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
4Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
5Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
6Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
7Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
8Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
9Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
10Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
11Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure