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Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 010907 (2019)
Date:
2018-12-04
Author Information
| Name | Institution |
|---|---|
| Asad J. Mughal | The Pennsylvania State University |
| Timothy N. Walter | The Pennsylvania State University |
| Kayla A. Cooley | The Pennsylvania State University |
| Adam Bertuch | Veeco Instruments |
| Suzanne E. Mohney | The Pennsylvania State University |
Films
Plasma MoS2
Film/Plasma Properties
Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: Raman Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Thickness
Analysis: AFM, Atomic Force Microscopy
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Substrates
| SiO2 |
| Sapphire |
| GaN |
Notes
| Used sapphire plasma tube due to Si contamination from quartz tube. |
| 1250 |