Publication Information

Title:
Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 010907 (2019)
Date:
2018-12-04

Author Information

Name Institution
Asad J. MughalThe Pennsylvania State University
Timothy N. WalterThe Pennsylvania State University
Kayla A. CooleyThe Pennsylvania State University
Adam BertuchVeeco Instruments
Suzanne E. MohneyThe Pennsylvania State University

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: Raman Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Thickness
Analysis: AFM, Atomic Force Microscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Substrates

SiO2
Sapphire
GaN

Keywords

Notes

Used sapphire plasma tube due to Si contamination from quartz tube.
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