Publication Information

Title: Effect of substrate on the growth and properties of MoS2 thin films grown by plasma-enhanced atomic layer deposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 37, 010907 (2019)

Date: 2018-12-04

DOI: http://dx.doi.org/10.1116/1.5074201

Author Information

Name

Institution

The Pennsylvania State University

The Pennsylvania State University

The Pennsylvania State University

Veeco Instruments

The Pennsylvania State University

Films

Deposition Temperature = 250C

923956-62-1

7783-06-4

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

QCM, Quartz Crystal Microbalance

Inficon

Thickness

Ellipsometry

J.A. Woollam M-88

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

PHI Versaprobe II

Thickness

Raman Spectroscopy

Horiba Jobin Yvon LabRAM HR800 Raman Spectroscope

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Raman Spectroscopy

Horiba Jobin Yvon LabRAM HR800 Raman Spectroscope

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Dimension ICON

Thickness

AFM, Atomic Force Microscopy

Bruker Dimension ICON

Images

TEM, Transmission Electron Microscope

FEI Talos F200X

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

FEI Talos F200X

Substrates

SiO2

Sapphire

GaN

Keywords

Notes

Used sapphire plasma tube due to Si contamination from quartz tube.

1250



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