Publication Information

Title: Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells

Type: Journal

Info: physica status solidi (RRL) - Rapid Research Letters Volume 9, Issue 7, pages 393-396, 2015

Date: 2015-06-10

DOI: http://dx.doi.org/10.1002/pssr.201510117

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma MoOx using Custom

Deposition Temperature Range = 50-200C

923956-62-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Unknown

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Unknown

-

Chemical Composition, Impurities

Unknown

-

Transmittance

Optical Transmission

-

Substrates

Si(100)

Keywords

Notes

505



Shortcuts



© 2014-2019 plasma-ald.com