Publication Information

Title:
Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 9, Issue 7, pages 393-396, 2015
Date:
2015-06-10

Author Information

Name Institution
Bart MaccoEindhoven University of Technology
Martijn F. J. VosEindhoven University of Technology
Nick F. W. ThissenEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma MoOx


Film/Plasma Properties

Characteristic: Thickness
Analysis: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -

Characteristic: Chemical Composition, Impurities
Analysis: -

Characteristic: Transmittance
Analysis: Optical Transmission

Substrates

Si(100)

Keywords

Notes

505