
Low-temperature atomic layer deposition of MoOx for silicon heterojunction solar cells
Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 9, Issue 7, pages 393-396, 2015
Date:
2015-06-10
Author Information
Name | Institution |
---|---|
Bart Macco | Eindhoven University of Technology |
Martijn F. J. Vos | Eindhoven University of Technology |
Nick F. W. Thissen | Eindhoven University of Technology |
Ageeth A. Bol | Eindhoven University of Technology |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: -
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -
Characteristic: Chemical Composition, Impurities
Analysis: -
Characteristic: Transmittance
Analysis: Optical Transmission
Substrates
Si(100) |
Notes
505 |