Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology

Type:
Journal
Info:
Nanoscale, 2018,10, 8615-8627
Date:
2018-04-17

Author Information

Name Institution
Akhil SharmaEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Longfei WuEindhoven University of Technology
Saurabh KarwalEindhoven University of Technology
Vincent VandalonEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
Ravi S. SundaramOxford Instruments
Jan P. HofmannEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology

Films

Plasma MoS2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Uniformity
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Electrochemical Performance
Analysis: Electrochemical Analysis

Substrates

SiO2
Glassy Carbon

Keywords

Photoelectrochemical (PEC) water splitting

Notes

1572