Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Info:
Nanoscale, 2018,10, 8615-8627
Author Information
Films
Film/Plasma Properties
Analysis: XRD, X-Ray Diffraction
Analysis: Raman Spectroscopy
Analysis: PL, PhotoLuminescence
Analysis: SEM, Scanning Electron Microscopy
Analysis: AFM, Atomic Force Microscopy
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: TEM, Transmission Electron Microscope
Analysis: Electron Diffraction
Analysis: Electrochemical Analysis
Substrates
Notes