Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Type:
Journal
Info:
Nanoscale, 2018,10, 8615-8627
Date:
2018-04-17
Author Information
| Name | Institution |
|---|---|
| Akhil Sharma | Eindhoven University of Technology |
| Marcel A. Verheijen | Eindhoven University of Technology |
| Longfei Wu | Eindhoven University of Technology |
| Saurabh Karwal | Eindhoven University of Technology |
| Vincent Vandalon | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Ravi S. Sundaram | Oxford Instruments |
| Jan P. Hofmann | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Ageeth A. Bol | Eindhoven University of Technology |
Films
Plasma MoS2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Uniformity
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Electrochemical Performance
Analysis: Electrochemical Analysis
Substrates
| SiO2 |
| Glassy Carbon |
Notes
| 1572 |