Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
Type:
Journal
Info:
Nanotechnology 31 (apr) 255603
Date:
2020-02-12
Author Information
| Name | Institution |
|---|---|
| Akhil Sharma | Eindhoven University of Technology |
| Reyhaneh Mahlouji | Eindhoven University of Technology |
| Longfei Wu | Eindhoven University of Technology |
| Marcel A. Verheijen | Eindhoven University of Technology |
| Vincent Vandalon | Eindhoven University of Technology |
| Shashank Balasubramanyam | Eindhoven University of Technology |
| Jan P. Hofmann | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Ageeth A. Bol | Eindhoven University of Technology |
Films
Plasma MoOx
Plasma WO3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
| SiO2 |
Notes
| 1642 |