BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten, CAS# 406462-43-9

Where to buy

NumberVendorRegionLink
1EreztechπŸ‡ΊπŸ‡ΈBis(tert-butylimino) bis(dimethylamino) tungsten(VI)
2DOCK/CHEMICALSπŸ‡©πŸ‡ͺBis(tert-butylimido)bis(dimethylamido)tungsten
3Santa Cruz BiotechnologyπŸ‡ΊπŸ‡ΈBis(tert-butylimino)bis(dimethylamino)tungsten(VI)
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylimido)bis(dimethylamino)tungsten(VI), min. 97% BTBMW
5Alfa ChemistryπŸ‡ΊπŸ‡ΈBIS(TERT-BUTYLIMINO)BIS(DIMETHYLAMINO)
6Pegasus ChemicalsπŸ‡¬πŸ‡§Bis(dimethylamino)bis(tert-butylimido)tungsten
7American ElementsπŸ‡ΊπŸ‡ΈBis(tert-butylimino)bis(dimethylamino)tungsten(VI)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 22 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
2Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
3The important role of water in growth of monolayer transition metal dichalcogenides
4Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
5Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
6Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100Β°C through Control of Plasma Chemistry
7Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
8Plasma-enhanced atomic layer deposition of tungsten nitride
9WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
10Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
11Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
12Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
13Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
14Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
15Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
16Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
17In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
18Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
19Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
20Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
21Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
22Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware