BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten, CAS# 406462-43-9

Where to buy

NumberVendorLink
1EreztechBis(tert-butylimino)bis(dimethylamino)tungsten(VI) (99.9%-W)
2Strem Chemicals, Inc.Bis(t-butylimido)bis(dimethylamino)tungsten(VI), min. 97% BTBMW

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
2Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
3Plasma-enhanced atomic layer deposition of tungsten nitride
4WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
5Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
6The important role of water in growth of monolayer transition metal dichalcogenides
7Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
8Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting


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