Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten, CAS# 406462-43-9

Where to buy

NumberVendorRegionLink
1Alfa Chemistry🇺🇸BIS(TERT-BUTYLIMINO)BIS(DIMETHYLAMINO)
2American Elements🇺🇸Bis(tert-butylimino)bis(dimethylamino)tungsten(VI)
3Strem Chemicals, Inc.🇺🇸Bis(t-butylimido)bis(dimethylamino)tungsten(VI), min. 97% BTBMW
4Pegasus Chemicals🇬🇧Bis(dimethylamino)bis(tert-butylimido)tungsten
5Santa Cruz Biotechnology🇺🇸Bis(tert-butylimino)bis(dimethylamino)tungsten(VI)
6DOCK/CHEMICALS🇩🇪Bis(tert-butylimido)bis(dimethylamido)tungsten
7Ereztech🇺🇸Bis(tert-butylimino) bis(dimethylamino) tungsten(VI)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 22 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
2Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
3Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
4WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
5Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
6In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
7Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
8Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
9Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
10Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
11Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
12Plasma-enhanced atomic layer deposition of tungsten nitride
13Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
14Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
15Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
16Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
17Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
18Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
19The important role of water in growth of monolayer transition metal dichalcogenides
20Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
21Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
22Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware