BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten, CAS# 406462-43-9

Where to buy

NumberVendorRegionLink
1Santa Cruz BiotechnologyπŸ‡ΊπŸ‡ΈBis(tert-butylimino)bis(dimethylamino)tungsten(VI)
2American ElementsπŸ‡ΊπŸ‡ΈBis(tert-butylimino)bis(dimethylamino)tungsten(VI)
3Pegasus ChemicalsπŸ‡¬πŸ‡§Bis(dimethylamino)bis(tert-butylimido)tungsten
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylimido)bis(dimethylamino)tungsten(VI), min. 97% BTBMW
5DOCK/CHEMICALSπŸ‡©πŸ‡ͺBis(tert-butylimido)bis(dimethylamido)tungsten
6Sigma-Aldrich, Co. LLCπŸ‡ΊπŸ‡ΈBis(tert-butylimino)bis(dimethylamino)tungsten(VI)
7Alfa ChemistryπŸ‡ΊπŸ‡ΈBIS(TERT-BUTYLIMINO)BIS(DIMETHYLAMINO)
8EreztechπŸ‡ΊπŸ‡ΈBis(tert-butylimino) bis(dimethylamino) tungsten(VI)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 19 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
2Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
3The important role of water in growth of monolayer transition metal dichalcogenides
4In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
5Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
6Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
7Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
8Plasma-enhanced atomic layer deposition of tungsten nitride
9Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
10Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
11Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
12Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
13Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
14Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
15Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
16WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
17Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
18Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
19Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting