BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten, CAS# 406462-43-9

Where to buy

NumberVendorRegionLink
1Santa Cruz Biotechnology🇺🇸Bis(tert-butylimino)bis(dimethylamino)tungsten(VI)
2Alfa Chemistry🇺🇸BIS(TERT-BUTYLIMINO)BIS(DIMETHYLAMINO)
3Strem Chemicals, Inc.🇺🇸Bis(t-butylimido)bis(dimethylamino)tungsten(VI), min. 97% BTBMW
4Ereztech🇺🇸Bis(tert-butylimino) bis(dimethylamino) tungsten(VI)
5DOCK/CHEMICALS🇩🇪Bis(tert-butylimido)bis(dimethylamido)tungsten
6American Elements🇺🇸Bis(tert-butylimino)bis(dimethylamino)tungsten(VI)
7Sigma-Aldrich, Co. LLC🇺🇸Bis(tert-butylimino)bis(dimethylamino)tungsten(VI)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 16 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1The important role of water in growth of monolayer transition metal dichalcogenides
2Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
3Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
4Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
5Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
6Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
7Plasma-enhanced atomic layer deposition of tungsten nitride
8Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
9Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
10Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
11Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
12Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
13Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
14WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
15In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
16Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma