|1||Strem Chemicals, Inc.||Bis(t-butylimido)bis(dimethylamino)tungsten(VI), min. 97% BTBMW|
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Your search for publications using this chemistry returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization|
|2||Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten|
|3||Plasma-enhanced atomic layer deposition of tungsten nitride|
|4||WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications|
|5||In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells|
|6||Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma|
|7||The important role of water in growth of monolayer transition metal dichalcogenides|
|8||Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells|
|9||Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting|
|10||Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides|
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