BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten, CAS# 406462-43-9

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(t-butylimido)bis(dimethylamino)tungsten(VI), min. 97% BTBMW
2DOCK/CHEMICALSπŸ‡©πŸ‡ͺBis(tert-butylimido)bis(dimethylamido)tungsten
3Pegasus ChemicalsπŸ‡¬πŸ‡§Bis(dimethylamino)bis(tert-butylimido)tungsten
4Alfa ChemistryπŸ‡ΊπŸ‡ΈBIS(TERT-BUTYLIMINO)BIS(DIMETHYLAMINO)
5Santa Cruz BiotechnologyπŸ‡ΊπŸ‡ΈBis(tert-butylimino)bis(dimethylamino)tungsten(VI)
6EreztechπŸ‡ΊπŸ‡ΈBis(tert-butylimino) bis(dimethylamino) tungsten(VI)
7American ElementsπŸ‡ΊπŸ‡ΈBis(tert-butylimino)bis(dimethylamino)tungsten(VI)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 20 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
2Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
3Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
4Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
5Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
6WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
7Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
8Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
9Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
10Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
11Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
12Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
13Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
14Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
15Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
16Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
17Plasma-enhanced atomic layer deposition of tungsten nitride
18Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
19The important role of water in growth of monolayer transition metal dichalcogenides
20Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides