|2||Strem Chemicals, Inc.||Bis(t-butylimido)bis(dimethylamino)tungsten(VI), min. 97% BTBMW|
www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.
If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.
Your search for publications using this chemistry returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization|
|2||Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten|
|3||Plasma-enhanced atomic layer deposition of tungsten nitride|
|4||WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications|
|5||In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells|
|6||Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma|
|7||The important role of water in growth of monolayer transition metal dichalcogenides|
|8||Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells|
|9||Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting|
|10||Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides|
© 2014-2019 plasma-ald.com