BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten, CAS# 406462-43-9

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NumberVendorLink
1EreztechBis(tert-butylimino)bis(dimethylamino)tungsten(VI) (99.9%-W)

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
2Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
3Plasma-enhanced atomic layer deposition of tungsten nitride
4WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
5Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
6In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
7Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
8The important role of water in growth of monolayer transition metal dichalcogenides
9Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
10Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
11Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides


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