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Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides

Type:

Journal

Info:

Scientific Reports (2019) 9:2768

Date:

2019-01-17

DOI:

https://doi.org/10.1038/s41598-019-39115-3

Author Information

Name	Institution
Christopher T Chen	Lawrence Berkeley National Laboratory
Jacopo Pedrini	Università degli Studi di Milano-Bicocca
E. Ashley Gaulding	Lawrence Berkeley National Laboratory
Christoph Kastl	Lawrence Berkeley National Laboratory
Giuseppe Calafiore	Lawrence Berkeley National Laboratory
Scott Dhuey	Lawrence Berkeley National Laboratory
Tevye R Kuykendall	Lawrence Berkeley National Laboratory
Stefano Cabrini	Lawrence Berkeley National Laboratory
Francesca M. Toma	Lawrence Berkeley National Laboratory
Shaul Aloni	Lawrence Berkeley National Laboratory
Adam M. Schwartzberg	Lawrence Berkeley National Laboratory

Films

Plasma WO₃

Hardware used: Oxford Instruments FlexAL

BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten

CAS#: 406462-43-9

CAS#: 7782-44-7

Deposition Temperature Range = 40-300C

Film/Plasma Properties

Substrates

SiO₂

Notes

1269