Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides

Type:
Journal
Info:
Scientific Reports (2019) 9:2768
Date:
2019-01-17
DOI:
https://doi.org/10.1038/s41598-019-39115-3

Author Information

Name Institution
Christopher T ChenLawrence Berkeley National Laboratory
Jacopo PedriniUniversità degli Studi di Milano-Bicocca
E. Ashley GauldingLawrence Berkeley National Laboratory
Christoph KastlLawrence Berkeley National Laboratory
Giuseppe CalafioreLawrence Berkeley National Laboratory
Scott DhueyLawrence Berkeley National Laboratory
Tevye R KuykendallLawrence Berkeley National Laboratory
Stefano CabriniLawrence Berkeley National Laboratory
Francesca M. TomaLawrence Berkeley National Laboratory
Shaul AloniLawrence Berkeley National Laboratory
Adam M. SchwartzbergLawrence Berkeley National Laboratory

Films

Plasma WO3

Hardware used: Oxford Instruments FlexAL
BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten
CAS#: 406462-43-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 40-300C

Film/Plasma Properties

Substrates

SiO2

Keywords

Notes

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