Publication Information

Title:
Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2020, 12 (3), pp 3873-3885
Date:
2019-12-27

Author Information

Name Institution
Shashank BalasubramanyamEindhoven University of Technology
Matthew A. BloodgoodEindhoven University of Technology
Mark van OmmerenEindhoven University of Technology
Tahsin FarazEindhoven University of Technology
Vincent VandalonEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology

Films

Plasma WS2



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: HAADF, High-Angle Annular Dark Field

Characteristic: Microstructure
Analysis: HAADF, High-Angle Annular Dark Field

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Substrates

SiO2

Keywords

Notes

Full paper available in thesis.
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