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Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2020, 12 (3), pp 3873-3885
Date:
2019-12-27
Author Information
| Name | Institution |
|---|---|
| Shashank Balasubramanyam | Eindhoven University of Technology |
| Matthew A. Bloodgood | Eindhoven University of Technology |
| Mark van Ommeren | Eindhoven University of Technology |
| Tahsin Faraz | Eindhoven University of Technology |
| Vincent Vandalon | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Marcel A. Verheijen | Eindhoven University of Technology |
| Ageeth A. Bol | Eindhoven University of Technology |
Films
Plasma WS2
Plasma WS2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: HAADF, High-Angle Annular Dark Field
Characteristic: Microstructure
Analysis: HAADF, High-Angle Annular Dark Field
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Substrates
| SiO2 |
Notes
| Full paper available in thesis. |
| 1531 |