Publication Information

Title:
Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
Type:
Journal
Info:
Scientific Reports 10:10392 (2020)
Date:
2020-05-20

Author Information

Name Institution
Ufuk KılıçUniversity of Nebraska
Alyssa MockUniversity of Nebraska
Derek SekoraUniversity of Nebraska
Simeon GilbertUniversity of Nebraska
Shah ValloppillyUniversity of Nebraska
Natale IannoUniversity of Nebraska
Marjorie LangellUniversity of Nebraska
Eva SchubertUniversity of Nebraska
Mathias SchubertUniversity of Nebraska

Films


Plasma TiO2


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Substrates

Si(100)

Keywords

Notes

1493