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Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
Type:
Journal
Info:
Scientific Reports 10:10392 (2020)
Date:
2020-05-20
Author Information
| Name | Institution |
|---|---|
| Ufuk Kılıç | University of Nebraska |
| Alyssa Mock | University of Nebraska |
| Derek Sekora | University of Nebraska |
| Simeon Gilbert | University of Nebraska |
| Shah Valloppilly | University of Nebraska |
| Natale Ianno | University of Nebraska |
| Marjorie Langell | University of Nebraska |
| Eva Schubert | University of Nebraska |
| Mathias Schubert | University of Nebraska |
Films
Other WO3
Plasma TiO2
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Substrates
| Si(100) |
Notes
| 1493 |