Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
Type:
Journal
Info:
Scientific Reports 10:10392 (2020)
Date:
2020-05-20
Author Information
Name | Institution |
---|---|
Ufuk Kılıç | University of Nebraska |
Alyssa Mock | University of Nebraska |
Derek Sekora | University of Nebraska |
Simeon Gilbert | University of Nebraska |
Shah Valloppilly | University of Nebraska |
Natale Ianno | University of Nebraska |
Marjorie Langell | University of Nebraska |
Eva Schubert | University of Nebraska |
Mathias Schubert | University of Nebraska |
Films
Other WO3
Plasma TiO2
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Substrates
Si(100) |
Notes
1493 |