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Publication Information

Title: Plasma-enhanced atomic layer deposition of tungsten nitride

Type: Journal

Info: Journal of Vacuum Science & Technology A 34, 051516 (2016)

Date: 2016-08-12

DOI: http://dx.doi.org/10.1116/1.4961567

Author Information

Name

Institution

Cambridge NanoTech

Stanford University

Stanford University

Stanford University

Films

Deposition Temperature Range = 100-400C

406462-43-9

7727-37-9

1333-74-0

Deposition Temperature = 250C

406462-43-9

7727-37-9

Deposition Temperature Range = 100-400C

406462-43-9

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Horiba Jobin Yvon UVISEL

Refractive Index

Ellipsometry

Horiba Jobin Yvon UVISEL

Extinction Coefficient

Ellipsometry

Horiba Jobin Yvon UVISEL

Resistivity, Sheet Resistance

Four-point Probe

Lucas Labs 302

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

PHI VersaProbe 5000

Substrates

Si(100)

SiO2

Keywords

Notes

901

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