Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


WN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing WN films returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
2A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
3Plasma-enhanced atomic layer deposition of tungsten nitride
4WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
5Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
6Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
7A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
8Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects
9Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier