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2024 Year in Review


The publication database currently has 1748 entries.
219 Films
293 Precursors
81 Dep Hardware Sets
258 Characteristics
99 Theses
5407 Authors

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WN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing WN films returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A New Pulse Plasma Enhanced Atomic Layer Deposition of Tungsten Nitride Diffusion Barrier for Copper Interconnect
2Plasma-enhanced atomic layer deposition of tungsten nitride
3Investigation of Tungsten Nitride Deposition Using Tungsten Hexafluoride Precursor for Via and Plug Metallization
4A controlled growth of WNx and WCx thin films prepared by atomic layer deposition
5Effects of NH3 pulse plasma on atomic layer deposition of tungsten nitride diffusion barrier
6WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
7Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier
8Method to enhance atomic-layer deposition of tungsten-nitride diffusion barrier for Cu interconnect
9Pulse plasma assisted atomic layer deposition of W–C–N thin films for Cu interconnects

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