Publication Information

Title:
Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
Type:
Journal
Info:
Journal of Applied Physics 124, 115302 (2018)
Date:
2018-08-01

Author Information

Name Institution
Ufuk KılıçUniversity of Nebraska
Derek SekoraUniversity of Nebraska
Alyssa MockUniversity of Nebraska
Rafał KorlackiUniversity of Nebraska
Shah ValloppillyUniversity of Nebraska
Elena M. Echeverrı́­aUniversity of Nebraska
Natale IannoUniversity of Nebraska
Eva SchubertUniversity of Nebraska
Mathias SchubertUniversity of Nebraska

Films

Other WO3


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Optical Properties
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si(100)

Keywords

Notes

1417