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Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
Type:
Journal
Info:
Journal of Applied Physics 124, 115302 (2018)
Date:
2018-08-01
Author Information
| Name | Institution |
|---|---|
| Ufuk Kılıç | University of Nebraska |
| Derek Sekora | University of Nebraska |
| Alyssa Mock | University of Nebraska |
| Rafał Korlacki | University of Nebraska |
| Shah Valloppilly | University of Nebraska |
| Elena M. Echeverrı́a | University of Nebraska |
| Natale Ianno | University of Nebraska |
| Eva Schubert | University of Nebraska |
| Mathias Schubert | University of Nebraska |
Films
Other WO3
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Optical Properties
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Si(100) |
Notes
| 1417 |