Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
Type:
Journal
Info:
ACS Materials Lett. 2020, 2, 511-518
Date:
2020-04-08
Author Information
| Name | Institution |
|---|---|
| Shashank Balasubramanyam | Eindhoven University of Technology |
| Marc J. M. Merkx | Eindhoven University of Technology |
| Marcel A. Verheijen | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Adriaan J. M. Mackus | Eindhoven University of Technology |
| Ageeth A. Bol | Eindhoven University of Technology |
Films
Plasma WS2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Area Selectivity
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Area Selectivity
Analysis: Raman Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| SiO2 |
| Al2O3 |
| NbS2 |
| Nb2O5 |
| MoOx |
| MoS2 |
| TiS2 |
| TiO2 |
| HfO2 |
Notes
| 1495 |