Publication Information

Title:
Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
Type:
Journal
Info:
ACS Materials Lett. 2020, 2, 511-518
Date:
2020-04-08

Author Information

Name Institution
Shashank BalasubramanyamEindhoven University of Technology
Marc J. M. MerkxEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology

Films

Plasma WS2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Area Selectivity
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Area Selectivity
Analysis: Raman Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

SiO2
Al2O3
NbS2
Nb2O5
MoOx
MoS2
TiS2
TiO2
HfO2

Keywords

Area Selective

Notes

1495