Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
Type:
Journal
Info:
Chem. Mater. 2019, 31, 5104-5115
Date:
2019-06-24
Author Information
| Name | Institution |
|---|---|
| Shashank Balasubramanyam | Eindhoven University of Technology |
| Mahdi Shirazi | Eindhoven University of Technology |
| Matthew A. Bloodgood | Eindhoven University of Technology |
| Longfei Wu | Eindhoven University of Technology |
| Marcel A. Verheijen | Eindhoven University of Technology |
| Vincent Vandalon | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Jan P. Hofmann | Eindhoven University of Technology |
| Ageeth A. Bol | Eindhoven University of Technology |
Films
Plasma WS2
Plasma WS2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Microstructure
Analysis: HAADF, High-Angle Annular Dark Field
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Electrochemical Performance
Analysis: Linear Sweep Voltammetry
Substrates
| SiO2 |
| Glassy Carbon |
Notes
| 1530 |