Publication Information

Title:
Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
Type:
Journal
Info:
Chem. Mater. 2019, 31, 5104-5115
Date:
2019-06-24

Author Information

Name Institution
Shashank BalasubramanyamEindhoven University of Technology
Mahdi ShiraziEindhoven University of Technology
Matthew A. BloodgoodEindhoven University of Technology
Longfei WuEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Vincent VandalonEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Jan P. HofmannEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology

Films



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Microstructure
Analysis: HAADF, High-Angle Annular Dark Field

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Electrochemical Performance
Analysis: Linear Sweep Voltammetry

Substrates

SiO2
Glassy Carbon

Keywords

Modeling
Catalysts

Notes

1530