Publication Information

Title: Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers

Type: Journal

Info: Chem. Mater. 2017, 29, 2024-2032

Date: 2017-02-03

DOI: http://dx.doi.org/10.1021/acs.chemmater.6b03951

Author Information

Name

Institution

Brent D. Keller

MIT

Adam Bertuch

Cambridge NanoTech

J Provine

Stanford University

Ganesh M. Sundaram

Cambridge NanoTech

Nicola Ferralis

MIT

Jeffrey C. Grossman

MIT

Films

Thermal MoOx using Veeco - Ultratech - Cambridge NanoTech Savannah

Deposition Temperature = 300C

Bis(t-butylimido)bis(dimethylamino)molybdenum

923956-62-1

Where to buy precursor

O3, Ozone

10028-15-6

Plasma MoOx using Veeco - Ultratech - Cambridge NanoTech Fiji

Deposition Temperature Range = 150-300C

Bis(t-butylimido)bis(dimethylamino)molybdenum

923956-62-1

Where to buy precursor

O2, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Nucleation

AFM, Atomic Force Microscopy

Unknown

Substrates

Silicon

SiO2

Keywords

Nucleation

Notes

1023


Mark Sowa

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