Publication Information

Title:
Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
Type:
Journal
Info:
Chem. Mater. 2017, 29, 2024-2032
Date:
2017-02-03

Author Information

Name Institution
Brent D. KellerMIT
Adam BertuchCambridge NanoTech
J ProvineStanford University
Ganesh M. SundaramCambridge NanoTech
Nicola FerralisMIT
Jeffrey C. GrossmanMIT

Films

Thermal MoOx


Plasma MoOx


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Nucleation
Analysis: AFM, Atomic Force Microscopy

Substrates

Silicon
SiO2

Keywords

Nucleation

Notes

1023