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Atomic layer epitaxy of germanium
Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
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Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
Type:
Journal
Info:
Chem. Mater. 2017, 29, 2024-2032
Date:
2017-02-03
Author Information
| Name | Institution |
|---|---|
| Brent D. Keller | MIT |
| Adam Bertuch | Cambridge NanoTech |
| J Provine | Stanford University |
| Ganesh M. Sundaram | Cambridge NanoTech |
| Nicola Ferralis | MIT |
| Jeffrey C. Grossman | MIT |
Films
Thermal MoOx
Plasma MoOx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Nucleation
Analysis: AFM, Atomic Force Microscopy
Substrates
| Silicon |
| SiO2 |
Keywords
| Nucleation |
Notes
| 1023 |