Publication Information

Title: Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers

Type: Journal

Info: Chem. Mater. 2017, 29, 2024-2032

Date: 2017-02-03

DOI: http://dx.doi.org/10.1021/acs.chemmater.6b03951

Author Information

Name

Institution

Brent D. Keller

MIT

Adam Bertuch

Cambridge NanoTech

J Provine

Stanford University

Ganesh M. Sundaram

Cambridge NanoTech

Nicola Ferralis

MIT

Jeffrey C. Grossman

MIT

Films

Thermal MoOx using Veeco - Ultratech - Cambridge NanoTech Savannah

Deposition Temperature = 300C

Bis(t-butylimido)bis(dimethylamino)molybdenum

923956-62-1

Where to buy precursor

O3, Ozone

10028-15-6

Plasma MoOx using Veeco - Ultratech - Cambridge NanoTech Fiji

Deposition Temperature Range = 150-300C

Bis(t-butylimido)bis(dimethylamino)molybdenum

923956-62-1

Where to buy precursor

O2, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Nucleation

AFM, Atomic Force Microscopy

-

Substrates

Silicon

SiO2

Keywords

Nucleation

Notes

1023


Mark Sowa

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