Search 1561 plasma ALD publications by:
Search 1561 plasma ALD publications by:
Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
Type:
Journal
Info:
Chem. Mater. 2017, 29, 2024-2032
Date:
2017-02-03
Author Information
Name | Institution |
---|---|
Brent D. Keller | MIT |
Adam Bertuch | Cambridge NanoTech |
J Provine | Stanford University |
Ganesh M. Sundaram | Cambridge NanoTech |
Nicola Ferralis | MIT |
Jeffrey C. Grossman | MIT |
Films
Thermal MoOx
Plasma MoOx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Nucleation
Analysis: AFM, Atomic Force Microscopy
Substrates
Silicon |
SiO2 |
Keywords
Nucleation |
Notes
1023 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |