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Publication Information

Title: Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Type: Journal

Info: Journal of Vacuum Science & Technology A 34, 01A103 (2016)

Date: 2015-08-25

DOI: http://dx.doi.org/10.1116/1.4930161

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma MoOx using Custom

Deposition Temperature Range = 50-350C

923956-62-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000U

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific KA1066 spectrometer

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Singletron

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Singletron

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Raman Spectroscopy

Renishaw Invia Raman

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Images

SEM, Scanning Electron Microscopy

FEI Nova 600i Nanolab

Substrates

Si(100)

Keywords

Notes

387

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