Publication Information

Title:
Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A103 (2016)
Date:
2015-08-25

Author Information

Name Institution
Martijn F. J. VosEindhoven University of Technology
Bart MaccoEindhoven University of Technology
Nick F. W. ThissenEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma MoOx


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Substrates

Si(100)

Keywords

Notes

387