Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 39, 053408 (2021)
Date:
2021-07-27

Author Information

Name Institution
Md. Istiaque ChowdhuryLehigh University
Mark J. SowaVeeco Instruments
Kylie E. Van MeterFlorida State University
Tomas F. BabuskaFlorida State University
Tomas GrejtakFlorida State University
Alexander Campbell KozenUniversity of Maryland
Brandon A. KrickFlorida State University
Nicholas C. StrandwitzLehigh University

Films


Film/Plasma Properties

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Stress
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Wear Rate
Analysis: Reciprocating Sliding Test

Characteristic: Friction Coefficient
Analysis: Reciprocating Sliding Test

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Silicon
SiO2
Sapphire

Keywords

Substrate Biasing
Tribology

Notes

1575