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Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 39, 053408 (2021)
Date:
2021-07-27
Author Information
| Name | Institution |
|---|---|
| Md. Istiaque Chowdhury | Lehigh University |
| Mark J. Sowa | Veeco Instruments |
| Kylie E. Van Meter | Florida State University |
| Tomas F. Babuska | Florida State University |
| Tomas Grejtak | Florida State University |
| Alexander Campbell Kozen | University of Maryland |
| Brandon A. Krick | Florida State University |
| Nicholas C. Strandwitz | Lehigh University |
Films
Plasma TiMoN
Film/Plasma Properties
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Stress
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Wear Rate
Analysis: Reciprocating Sliding Test
Characteristic: Friction Coefficient
Analysis: Reciprocating Sliding Test
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Silicon |
| SiO2 |
| Sapphire |
Notes
| 1575 |