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Publication Information

Title: Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges

Type: Journal

Info: Sustainable Energy Fuels, 2017, 1, 30

Date: 2016-12-24

DOI: http://dx.doi.org/10.1039/C6SE00076B

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Solliance Solar Research

Eindhoven University of Technology

Solliance Solar Research

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature Range = 30-80C

75-24-1

7782-44-7

Deposition Temperature Range = 80-120C

75-24-1

7732-18-5

Deposition Temperature Range = 100-120C

557-20-0

7732-18-5

Deposition Temperature Range = 50-80C

546-68-9

7782-44-7

Deposition Temperature Range = 50-80C

923956-62-1

7782-44-7

Plasma NiOx using Custom

Deposition Temperature = 50C

1293-95-4

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific KA1066 spectrometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Substrates

MAPbI3, methylammonium lead iodide

Keywords

Solar

Plasma vs Thermal Comparison

Notes

982



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