Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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B. L. Williams Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by B. L. Williams returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
2Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
3Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition