Publication Information

Title:
Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B129 (2017)
Date:
2016-11-28

Author Information

Name Institution
Saurabh KarwalEindhoven University of Technology
B. L. WilliamsEindhoven University of Technology
J.-P. NiemeläEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Mariadriana CreatoreEindhoven University of Technology

Films


Plasma HfNx


Film/Plasma Properties

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: Ellipsometry

Characteristic: Optical Bandgap
Analysis: Ellipsometry

Substrates

Si(100)

Keywords

Notes

898