Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B141 (2017)
Date:
2016-12-08
DOI:
http://dx.doi.org/10.1116/1.4972776

Author Information

Name Institution
Adam BertuchCambridge NanoTech
Brent D. KellerMIT
Nicola FerralisMIT
Jeffrey C. GrossmanMIT
Ganesh M. SundaramCambridge NanoTech

Films

Plasma MoCN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Bis(t-butylimido)bis(dimethylamino)molybdenum
CAS#: 923956-62-1
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N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0

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Deposition Temperature Range = 80-300C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Lucas Labs 302

Characteristic: Critical Temperature
Analysis: Critical Temperature Measurement
Diagnostic: Quantum Design PPMS

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: Rigaku Smartlab

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Digital Instruments Nanoscope IV

Substrates

Si with native oxide
SiO2

Notes

890