Publication Information

Title: Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum

Type: Journal

Info: Journal of Vacuum Science & Technology A 35, 01B141 (2017)

Date: 2016-12-08

DOI: http://dx.doi.org/10.1116/1.4972776

Author Information

Name

Institution

Cambridge NanoTech

MIT

MIT

MIT

Cambridge NanoTech

Films

Deposition Temperature Range = 80-300C

923956-62-1

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Resistivity, Sheet Resistance

Four-point Probe

Lucas Labs 302

Critical Temperature

Critical Temperature Measurement

Quantum Design PPMS

Thickness

Ellipsometry

Horiba Jobin Yvon UVISEL

Refractive Index

Ellipsometry

Horiba Jobin Yvon UVISEL

Extinction Coefficient

Ellipsometry

Horiba Jobin Yvon UVISEL

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Rigaku Smartlab

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Digital Instruments Nanoscope IV

Substrates

Si with native oxide

SiO2

Keywords

Superconductor

Notes

890



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