Publication Information

Title:
Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis(tert-butylimido)bis(dimethylamido) molybdenum
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B141 (2017)
Date:
2016-12-08

Author Information

Name Institution
Adam BertuchCambridge NanoTech
Brent D. KellerMIT
Nicola FerralisMIT
Jeffrey C. GrossmanMIT
Ganesh M. SundaramCambridge NanoTech

Films


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Critical Temperature
Analysis: Critical Temperature Measurement

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si with native oxide
SiO2

Keywords

Superconductor

Notes

890