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Plasma-enhanced atomic layer deposition of vanadium nitride
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 061505 (2019)
Date:
2019-09-25
Author Information
| Name | Institution |
|---|---|
| Alexander Campbell Kozen | U.S. Naval Research Laboratory |
| Mark J. Sowa | Cambridge NanoTech |
| Ling Ju | Lehigh University |
| Nicholas C. Strandwitz | Lehigh University |
| Guosong Zeng | Lehigh University |
| Tomas F. Babuska | Lehigh University |
| Zakaria Hsain | University of Pennsylvania |
| Brandon A. Krick | Lehigh University |
Films
Plasma VN
Film/Plasma Properties
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Wear Rate
Analysis: Pin on Disc
Characteristic: Friction Coefficient
Analysis: Pin on Disc
Substrates
| Si(100) |
| SiO2 |
Notes
| 1373 |