Plasma-enhanced atomic layer deposition of vanadium nitride

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 061505 (2019)
Date:
2019-09-25
DOI:
http://dx.doi.org/10.1116/1.5109671

Author Information

Name Institution
Alexander Campbell KozenU.S. Naval Research Laboratory
Mark J. SowaCambridge NanoTech
Ling JuLehigh University
Nicholas C. StrandwitzLehigh University
Guosong ZengLehigh University
Tomas F. BabuskaLehigh University
Zakaria HsainUniversity of Pennsylvania
Brandon A. KrickLehigh University

Films

Plasma VN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TDMAV, (Me2N)4V, [(CH3)2N]4V, Tetrakis(DiMethylAmido) Vanadium, Vanadium Dimethylamide
CAS#: 19824-56-7
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature Range = 150-350C

Film/Plasma Properties

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Empyrean

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: PANalytical Empyrean

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam alpha-SE

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam alpha-SE

Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Diagnostic: J.A. Woollam alpha-SE

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Lucas Labs 302

Characteristic: Wear Rate
Analysis: Pin on Disc
Diagnostic: Custom

Characteristic: Friction Coefficient
Analysis: Pin on Disc
Diagnostic: Custom

Substrates

Si(100)
SiO2

Notes

1373