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Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
Type:
Journal
Info:
Materials 2020, 13, 1058
Date:
2020-02-20
Author Information
| Name | Institution |
|---|---|
| Katherine Hansen | Boston University |
| Melissa Cardona | Purdue University |
| Amartya Dutta | Boston University |
| Chen Yang | Boston University |
Films
Plasma TiN
Plasma TiN
Film/Plasma Properties
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Substrates
| MgO |
| Si(100) |
Notes
| 1457 |