Publication Information

Title:
Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
Type:
Journal
Info:
Materials 2020, 13, 1058
Date:
2020-02-20

Author Information

Name Institution
Katherine HansenBoston University
Melissa CardonaPurdue University
Amartya DuttaBoston University
Chen YangBoston University

Films



Film/Plasma Properties

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Substrates

MgO
Si(100)

Keywords

Notes

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