Your search for plasma enhanced atomic layer deposition publications using Aixtron Genus Stratagem 200 hardware returned 4 records. If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia|
|2||Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications|
|3||Emerging Atomic Layer Deposition (ALD) Processes For Low Thermal Budget Flexible Electronics|
|4||Epitaxially grown crystalline Al2O3 interlayer on β-Ga2O3 (010) and its suppressed interface state density|
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