Publication Information

Title:
Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
Type:
Conference Proceedings
Info:
Mat. Res. Soc. Symp. Proc. Vol. 811
Date:
2004-01-01

Author Information

Name Institution
Xinye LiuGenus, Inc.
Sasangan RamanathanGenus, Inc.
Eddie LeeGenus, Inc.
Thomas E. SeidelGenus, Inc.

Films

Thermal AlN


Plasma AlN


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Uniformity
Analysis: Ellipsometry

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Substrates

Silicon

Keywords

Nucleation
Plasma vs Thermal Comparison

Notes

1161